2 ~ 6 inch 4° kwụsịrị-n'akuku P-ụdị 4H-SiC mkpụrụ

Nkọwa dị mkpirikpi:

4 ° off-angle P-ụdị 4H-SiC mkpụrụ bụ ihe a kapịrị ọnụ nke semiconductor, ebe "4 ° off-angle" na-ezo aka na akụkụ nghazi kristal nke wafer bụ 4 degrees off-angle, na "P-ụdị" na-ezo aka. ụdị conductivity nke semiconductor. Ihe a nwere ngwa dị mkpa na ụlọ ọrụ semiconductor, karịsịa na mpaghara eletriki eletriki na eletrik eletrik dị elu.


Nkọwa ngwaahịa

Mkpado ngwaahịa

Semicera's 2~6 inch 4° off-angle P-type 4H-SiC substrates ka emebere iji gboo mkpa na-eto eto nke ike na-arụ ọrụ dị elu yana ndị na-emepụta ngwaọrụ RF. Ntuzi aka n'akụkụ 4° na-eme ka uto epitaxial kachasị mma, na-eme ka mkpụrụ a bụrụ ezigbo ntọala maka ọtụtụ ngwaọrụ semiconductor, gụnyere MOSFET, IGBT na diodes.

Nke a 2 ~ 6 inch 4 ° off-angle P-type 4H-SiC substrate nwere ihe onwunwe magburu onwe ya, gụnyere elu okpomọkụ conductivity, ezigbo ọkụ eletrik, na nkwụsi ike n'ibu. Ntuzi aka n'akụkụ anya na-enyere aka belata njupụta micropipe ma na-akwalite akwa epitaxial dị nro, nke dị oke mkpa iji melite arụmọrụ na ntụkwasị obi nke ngwaọrụ semiconductor ikpeazụ.

Semicera's 2 ~ 6 inch 4° off-angle P-type 4H-SiC substrates dị n'ụdị dayameta dị iche iche, sitere na sentimita 2 ruo 6 sentimita, iji zute ihe nrụpụta dị iche iche. A na-emezi mkpụrụ anyị nke ọma iji nye ọkwa doping edo edo na njirimara elu dị elu, na-ahụ na wafer ọ bụla na-ezute nkọwa siri ike achọrọ maka ngwa eletrọnịkị dị elu.

Nkwenye nke Semicera maka imepụta ihe ọhụrụ na ịdị mma na-eme ka o doo anya na 2 ~ 6 inch 4 ° off-angle P-type 4H-SiC substrates na-ebuga arụmọrụ na-agbanwe agbanwe n'ọtụtụ ngwa sitere na ngwa elektrọnik gaa na ngwaọrụ dị elu. Ngwaahịa a na-enye ihe ngwọta a pụrụ ịdabere na ya maka ọgbọ na-esote nke ike na-arụ ọrụ nke ọma, semiconductor na-arụ ọrụ dị elu, na-akwado ọganihu nkà na ụzụ na ụlọ ọrụ dị ka ụgbọala, telecommunications, na ume ọhụrụ.

Ụkpụrụ metụtara nha

Nha 2 anụ ọhịa 4 anụ ọhịa
Dayameta 50.8 mm± 0.38 mm 100.0 mm + 0/-0.5 mm
Nhazi elu 4° chere ihu <11-20>±0.5° 4° chere ihu <11-20>±0.5°
Ogologo Flat nke izizi 16.0 mm± 1.5mm 32.5mm ± 2mm
Ogologo Flat nke abụọ 8.0 mm± 1.5mm 18.0 mm ± 2 mm
Nhazi Flat nke izizi Parallelto <11-20>±5.0° Parallelto <11-20>±5.0c
Nhazi Flat nke abụọ 90°CW site na isi ± 5.0°, silicon ihu elu 90°CW site na isi ± 5.0°, silicon ihu elu
Emecha elu elu C-Ihu: Ngwa anya Polish, Si-Ihu: CMP C-Ihu: OpticalPolish, Si-Ihu: CMP
Wafer Edge Ịgba egwu Ịgba egwu
Ọdịdị dị n'elu Si-Face Ra <0.2 nm Si-Face Ra <0.2nm
Ọkpụrụkpụ 350.0± 25.0um 350.0± 25.0um
Ụdị poly 4H 4H
Doping p-Ụdị p-Ụdị

Ụkpụrụ metụtara nha

Nha 6 anụ ọhịa
Dayameta 150.0 mm + 0/-0.2 mm
Ntuzi ihu ihu 4° chere ihu <11-20>±0.5°
Ogologo Flat nke izizi 47.5 mm ± 1.5mm
Ogologo Flat nke abụọ Ọ dịghị
Nhazi Flat nke izizi Yiri na <11-20>±5.0°
Usoro nke abụọ Flat 90°CW site na isi ± 5.0°, silicon chere ihu
Emecha elu elu C-Ihu: Ngwa anya Polish, Si-Ihu:CMP
Wafer Edge Ịgba egwu
Ọdịdị dị n'elu Si-Face Ra <0.2 nm
Ọkpụrụkpụ 350.0± 25.0μm
Ụdị poly 4H
Doping p-Ụdị

Raman

2-6 inch 4° kwụsịrị-akuku P-ụdị 4H-SiC mkpụrụ-3

Usoro na-ama jijiji

2-6 inch 4° kwụsịrị-akuku P-ụdị 4H-SiC mkpụrụ-4

Njupụta dislocation (KOH etching)

2-6 inch 4° kwụsịrị-akuku P-ụdị 4H-SiC mkpụrụ-5

Foto ndị na-akpachapụ anya KOH

2-6 inch 4° kwụsịrị-akuku P-ụdị 4H-SiC mkpụrụ-6
SiC wafers

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