6 inch N-ụdị SiC mkpụrụ

Nkọwa dị mkpirikpi:

Semicera na-enye ọtụtụ 4H-8H SiC wafers. Ruo ọtụtụ afọ, anyị bụ onye na-emepụta ihe na onye na-ebubata ngwaahịa na ụlọ ọrụ semiconductor na fotovoltaic. Isi ngwaahịa anyị gụnyere: Silicon carbide etch plates, silicon carbide boat trailers, silicon carbide wafer ụgbọ mmiri (PV & Semiconductor), silicon carbide furnace tubes, silicon carbide cantilever paddles, silicon carbide chucks, silicon carbide beams, yana CVD SiC mkpuchi na. Ihe mkpuchi TaC. Na-ekpuchi ọtụtụ ahịa Europe na America. Anyị na-atụ anya ịbụ onye mmekọ gị ogologo oge na China.

 

Nkọwa ngwaahịa

Mkpado ngwaahịa

Silicon carbide (SiC) otu ihe kristal nwere nnukwu oghere obosara (~ Si 3 ugboro), ịdị elu nke thermal conductivity (~ Si 3.3 ugboro ma ọ bụ GaAs ugboro 10), ọnụego mgbanwe saturation elektrọn dị elu (~ Si 2.5 ugboro), ọkụ eletrik dị elu. ubi (~ Si ugboro 10 ma ọ bụ GaAs 5 ugboro) na njirimara ndị ọzọ pụtara ìhè.

Ọgbọ nke atọ semiconductor ihe tumadi gụnyere SiC, GaN, diamond, wdg, n'ihi na ya band ọdịiche obosara (Eg) karịrị ma ọ bụ hà 2.3 electron volts (eV), makwaara dị ka wide band gap semiconductor ihe. E jiri ya tụnyere nke mbụ na nke abụọ ọgbọ semiconductor ihe, ọgbọ nke atọ semiconductor ihe nwere uru nke elu thermal conductivity, elu mmebi eletriki, elu juputara eletrọn Mbugharị ọnụego na elu bonding ike, nke nwere ike izute ọhụrụ chọrọ nke ọgbara ọhụrụ technology electronic maka elu. okpomọkụ, ike dị elu, nrụgide dị elu, ugboro ugboro na nguzogide radieshon na ọnọdụ ndị ọzọ siri ike. Ọ nwere atụmanya ngwa dị mkpa na mpaghara nchekwa mba, ụgbọ elu, ikuku ikuku, nyocha mmanụ, nchekwa anya, wdg, ma nwee ike belata ọnwụ ike karịa 50% n'ọtụtụ ụlọ ọrụ dị mkpa dị ka nkwukọrịta brọdband, ike anyanwụ, nrụpụta ụgbọ ala, semiconductor ọkụ, na smart grid, ma nwee ike ibelata olu akụrụngwa karịa 75%, nke bụ ihe dị mkpa maka mmepe sayensị na teknụzụ mmadụ.

Ike Semicera nwere ike inye ndị ahịa ihe nrụpụta dị elu (Conductive), Semi-insulating (Semi-insulating), HPSI (High Purity Semi-insulating) silicon carbide substrate; Na mgbakwunye, anyị nwere ike inye ndị ahịa akwụkwọ mpempe akwụkwọ silicon carbide dị iche iche na nke dị iche iche; Anyị nwekwara ike hazie mpempe akwụkwọ epitaxial dị ka mkpa ndị ahịa si dị, ọ nweghịkwa ọnụọgụ kacha nta.

Ihe

Mmepụta

Nnyocha

Dummy

kristal Parameters

Ụdị poly

4H

Njehie nhazi ihu elu

<11-20>4±0.15°

Igwe ọkụ eletrik

Dopant

n-ụdị Nitrogen

Nguzogide

0.015-0.025ohm·cm

Mechanical Parameters

Dayameta

150.0± 0.2mm

Ọkpụrụkpụ

350± 25 μm

Ntuzi aka dị larịị

[1-100]±5°

Ogologo larịị nke isi

47.5 ± 1.5mm

Ụlọ nke abụọ

Ọ dịghị

TTV

≤5 μm

≤10 μm

≤15 μm

LTV

≤3 μm (5mm*5mm)

≤5 μm (5mm*5mm)

≤10 μm (5mm*5mm)

Ụta

-15μm ~ 15μm

-35μm ~ 35μm

-45μm ~ 45μm

Warp

≤35 μm

≤45 μm

≤55 μm

Ihu ihu (Si-face) adịghị ike (AFM)

Ra≤0.2nm (5μm*5μm)

Nhazi

Njupụta Micropipe

<1 ea/cm2

<10 nkea/cm2

<15 ea/cm2

Igwe adịghị ọcha

≤5E10atom/cm2

NA

BPD

≤1500 ea/cm2

≤3000 ea/cm2

NA

TSD

≤500 ea/cm2

≤1000 ea/cm2

NA

Ogo ihu

N'ihu

Si

Ngwucha elu

Si-ihu CMP

Ụmụ irighiri ihe

≤60ea/wafer (nha≥0.3μm)

NA

Ọkpụkpụ

≤5ea/mm. Ogologo ngụkọta ≤ Dayameta

Ogologo ngụkọta ≤2* dayameta

NA

Peel oroma / olulu / ntụpọ / striations / mgbawa / mmetọ

Ọ dịghị

NA

Iberibe ibe / indents / mgbaji / hex

Ọ dịghị

Mpaghara polytype

Ọ dịghị

Mpaghara mkpokọta≤20%

Mpaghara mkpokọta≤30%

Akara laser n'ihu

Ọ dịghị

Ogo azụ

Ngwunye azụ

C-ihu CMP

Ọkpụkpụ

≤5ea/mm, Mgbakọ ogologo≤2* dayameta

NA

Nrụrụ azụ (nkịta ihu/indents)

Ọ dịghị

Azụ isi ike

Ra≤0.2nm (5μm*5μm)

Akara laser azụ

1 mm (si n'akụkụ elu)

Ọnụ

Ọnụ

Chamfer

Nkwakọ ngwaahịa

Nkwakọ ngwaahịa

Epi dị njikere na nkwakọ ihe efu

Ngwunye cassette ọtụtụ wafer

* Ihe edeturu: "NA" pụtara enweghị arịrịọ Ihe anaghị ekwupụta nwere ike na-ezo aka na SEMI-STD.

tech_1_2_size
SiC wafers

Ụlọ ọrụ Semicera Ụlọ ọrụ Semicera 2 Igwe eji eme ihe Nhazi CNN, nhicha kemịkalụ, mkpuchi CVD Ọrụ anyị


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