Atomic Layer Deposition (ALD) bụ nkà na ụzụ na-etinye ihe nkuku kemịkalụ nke na-eto ihe nkiri dị gịrịgịrị site na oyi akwa site n'itinye mkpụrụ ndụ ihe abụọ ma ọ bụ karịa. ALD nwere uru nke njikwa dị elu na ịdị n'otu, enwere ike iji ya na ngwaọrụ semiconductor, ngwaọrụ optoelectronic, ngwaọrụ nchekwa ike na mpaghara ndị ọzọ. Ụkpụrụ ndị bụ isi nke ALD gụnyere precursor adsorption, mmeghachi omume elu na mwepụ site na ngwaahịa, yana ọtụtụ ihe nwere ike ịmepụta site na ịmegharị usoro ndị a na okirikiri. ALD nwere njirimara na uru nke njikwa elu dị elu, ịdị n'otu, na ihe na-adịghị mma, a pụkwara iji ya mee ihe maka ntinye nke ihe dị iche iche nke mkpụrụ na ihe dị iche iche.
ALD nwere njirimara na uru ndị a:
1. Oke njikwa:Ebe ọ bụ na ALD bụ usoro uto oyibo-site-layer, enwere ike ịchịkwa oke na ihe mejupụtara nke ọ bụla nke ihe onwunwe.
2. Ịdị n'otu:ALD nwere ike idowe ihe n'otu n'otu n'elu mkpụrụ osisi dum, na-ezere adịghị mma nke nwere ike ime na teknụzụ nkwụnye ego ndị ọzọ.
3. Ọdịdị na-adịghị porous:Ebe ọ bụ na a na-edobe ALD n'ime nkeji nke otu atọm ma ọ bụ otu ụmụ irighiri ihe, ihe nkiri a na-esi na ya na-enwekarị ihe owuwu na-enweghị oghere.
4. Ọrụ mkpuchi dị mma:ALD nwere ike kpuchie akụkụ akụkụ dị elu nke ọma, dị ka arrays nanopore, ihe porosity dị elu, wdg.
5. Mgbanwe:Enwere ike iji ALD maka ihe dị iche iche nke mkpụrụ, gụnyere ọla, semiconductor, iko, wdg.
6. Ntughari:Site n'ịhọrọ ihe dị iche iche precursor molecules, ihe dị iche iche dị iche iche nwere ike idobe na usoro ALD, dị ka metal oxides, sulfides, nitrides, wdg.
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