SiC-kpuchiri Epitaxial Reactor Barrel

Nkọwa dị mkpirikpi:

Semicera na-enye ọtụtụ ihe susceptors na ihe graphite emebere maka ndị na-emegharị epitaxy dị iche iche.

Site na mmekorita atụmatụ ya na OEM ndị na-eduzi ụlọ ọrụ, ọkachamara ihe dị ukwuu, yana ike nrụpụta dị elu, Semicera na-ebupụta atụmatụ ahaziri iji mezuo ihe achọrọ ngwa gị. Nkwenye anyị maka ịdị mma na-eme ka ị nweta azịza kachasị mma maka mkpa reactor epitaxy gị.

 

 


Nkọwa ngwaahịa

Mkpado ngwaahịa

Nkọwa

Ụlọ ọrụ anyị na-enyemkpuchi SiCusoro ọrụ n'elu graphite, ceramics na ihe ndị ọzọ site CVD usoro, nke mere na pụrụ iche gas nwere carbon na silicon nwere ike meghachi omume na elu okpomọkụ iji nweta elu-ọcha Sic ụmụ irighiri, nke nwere ike na-edebe n'elu nke mkpuchi ihe na-etolite a.oyi akwa mkpuchi SiCmaka epitaxy barel ụdị hy pnotic.

 

otu (1)

nke (2)

Isi atụmatụ

1. Nguzogide oxidation dị elu:
Nguzogide oxidation ka dị ezigbo mma mgbe okpomọkụ dị elu dị ka 1600 C.
2. Nnukwu ịdị ọcha: nke a na-eme site na ntinye ikuku kemịkalụ n'okpuru ọnọdụ chlorination dị elu.
3. Nguzogide nbibi: elu ike, kọmpat elu, ezigbo ahụ.
4. Nguzogide corrosion: acid, alkali, nnu na organic reagents.

Nkọwa isi nke mkpuchi CVD-SIC

Njirimara SiC-CVD
Ọdịdị kristal FCC β oge
Njupụta g/cm ³ 3.21
Isi ike Vickers isi ike 2500
Nha ọka μm 2 ~ 10
Ịdị ọcha kemịkalụ % 99,99995
Ike ikpo ọkụ J·kg-1 · K-1 640
Sublimation okpomọkụ 2700
Ike Felexural MPa (RT 4-isi) 415
Modul nke Young GPA (4pt gbagọọ, 1300 ℃) 430
Mgbasawanye okpomọkụ (CTE) 10-6K-1 4.5
Thermal conductivity (W/mK) 300
Ụlọ ọrụ Semicera
Ụlọ ọrụ Semicera 2
Igwe eji eme ihe
Nhazi CNN, nhicha kemịkalụ, mkpuchi CVD
Ọrụ anyị

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