CVD TaC mkpuchi

 

Okwu Mmalite nke CVD TaC mkpuchi:

 

Ihe mkpuchi CVD TaC bụ teknụzụ na-eji ntinye mmiri kemịkalụ iji tinye mkpuchi tantalum carbide (TaC) n'elu mkpụrụ. Tantalum carbide bụ ihe seramiiki na-arụ ọrụ dị elu nke nwere ezigbo igwe na akụrụngwa kemịkalụ. Usoro CVD na-emepụta ihe nkiri TaC edo edo n'elu mkpụrụ ahụ site na mmeghachi omume gas.

 

Isi atụmatụ:

 

Magburu onwe ike na eyi iguzogide: Tantalum carbide nwere isi ike dị oke elu, yana mkpuchi CVD TaC nwere ike imeziwanye nguzogide eyi nke mkpụrụ. Nke a na-eme ka mkpuchi ahụ dị mma maka ngwa na gburugburu ebe a na-eyi uwe dị elu, dị ka ngwá ọrụ ịkpụ na ihe ọkpụkpụ.

Oke okpomọkụ kwụsie ike: Ihe mkpuchi TaC na-echebe ọkụ dị oke egwu na ihe ndị na-emepụta ihe na okpomọkụ ruo 2200 Celsius, na-egosipụta nkwụsi ike dị mma. Ọ na-edobe nkwụsi ike nke kemịkalụ na nhazi n'okpuru ọnọdụ okpomọkụ dị oke, na-eme ka ọ dị mma maka nhazi okpomọkụ na ngwa ngwa na gburugburu ebe okpomọkụ.

Nkwụsi ike kemịkalụ mara mma: Tantalum carbide nwere ike corrosion eguzogide ọtụtụ acids na alkalis, na CVD TaC mkpuchi nwere ike n'ụzọ dị irè gbochie mmebi nke mkpụrụ na gburugburu corrosive.

Ebe mgbaze dị elu: Tantalum carbide nwere ebe mgbaze dị elu (ihe dị ka 3880 Celsius C), na-enye ohere iji mkpuchi CVD TaC mee ihe na ọnọdụ okpomọkụ dị elu na-enweghị agbaze ma ọ bụ na-eweda ya ala.

Ezigbo thermal conductivity: Ihe mkpuchi TaC nwere ihe nrụpụta ọkụ dị elu, nke na-enyere aka ịgbasa ọkụ nke ọma na usoro okpomọkụ dị elu ma gbochie ikpo ọkụ mpaghara.

 

Ngwa nwere ike ime:

 

• Gallium Nitride (GaN) na Silicon Carbide epitaxial CVD reactor components gụnyere ndị na-ebu wafer, efere satịlaịtị, isi mmiri ịsa ahụ, uko ụlọ, na ihe ndị na-akpata.

• Silicon carbide, gallium nitride na aluminum nitride (AlN) ihe ndị na-eto eto kristal gụnyere crucibles, ndị na-ejide mkpụrụ osisi, mgbanaka nduzi na nzacha.

• Akụrụngwa ụlọ ọrụ gụnyere ihe ndị na-ekpo ọkụ na-eguzogide ọgwụ, nsị injection, mgbanaka ihe mkpuchi na jigs brazing

 

Atụmatụ ngwa:

 

• Okpomọkụ kwụsiri ike karịa 2000 Celsius, na-enye ohere ịrụ ọrụ na oke okpomọkụ
• Na-eguzogide hydrogen (Hz), amonia (NH3), monosilane (SiH4) na silicon (Si), na-enye nchebe na gburugburu kemịkalụ siri ike.
• Ya thermal ujo eguzogide na-enyere ọsọ ọsọ cycles
• Graphite nwere adhesion siri ike, na-eme ka ogologo ndụ ọrụ na enweghị delamination mkpuchi.
• Oke dị oke ọcha iji kpochapụ adịghị ọcha ma ọ bụ mmetọ na-adịghị mkpa
• Mkpuchi mkpuchi dabara adaba na nnabata nha nha

 

Nkọwa nka na ụzụ:

 

Nkwadebe akwa mkpuchi tantalum carbide nke CVD:

 Tantalum Carbide Coting Site na usoro CVD

Mkpuchi TAC nwere nnukwu crystallinity na ezigbo edoghị anya:

 Mkpuchi TAC nwere kristal dị elu yana ezigbo edo edo

 

 

CVD TAC mkpuchi ihe nka nka_Semicera:

 

Njirimara anụ ahụ nke mkpuchi TaC
Njupụta 14.3 (g/cm³)
Nnukwu itinye uche 8 x1015/cm
Mgbapụta pụrụ iche 0.3
Ọnụọgụ mgbasawanye okpomọkụ 6.3 10-6/K
Isi ike (HK) 2000 HK
Nnukwu Resistivity 4.5 mm-mm
Nguzogide 1 x10-5Ohm*cm
Nkwụsi ike okpomọkụ <2500 ℃
Mbugharị 237 cm2/Vs
Mgbanwe nha eserese -10 ~ -20 nkeji
mkpuchi mkpuchi ≥20um uru nkịtị (35um+10um)

 

Ndị a dị n'elu bụ ụkpụrụ.