Usoro maka ịkwadebe mkpuchi silicon carbide

Ugbu a, ụzọ nkwadebe nkeMkpuchi SiCtumadi gụnyere usoro gel-sol, usoro ntinye, usoro mkpuchi ahịhịa, usoro ịgbasa plasma, usoro mmeghachi omume gas (CVR) na usoro ntinye mmiri kemịkalụ (CVD).

Usoro ntinye:

Usoro bụ ụdị elu okpomọkụ siri ike na-adọ sintering, nke tumadi na-eji ngwakọta nke Si ntụ ntụ na C ntụ ntụ dị ka embedding ntụ ntụ, na graphite matrix na-enịm ke embedding ntụ ntụ, na elu okpomọkụ sintering na-rụrụ na inert gas. , na n'ikpeazụ nkeMkpuchi SiCA na-enweta ya n'elu matriks graphite.Usoro ahụ dị mfe na nchikota n'etiti mkpuchi na mkpụrụ ahụ dị mma, ma ọdịdị nke mkpuchi ahụ n'akụkụ ntụziaka nke ọkpụrụkpụ adịghị mma, nke dị mfe ịmepụta oghere ndị ọzọ na-eduga na nkwụsị nke oxidation na-adịghị mma.

 

Usoro mkpuchi ahịhịa:

Usoro mkpuchi ahịhịa bụ tumadi iji kpochaa akụrụngwa mmiri dị n'elu matriks graphite, wee gwọọ akụrụngwa ahụ n'otu ọnọdụ okpomọkụ iji dozie mkpuchi ahụ.Usoro ahụ dị mfe na ọnụ ahịa dị ala, ma mkpuchi nke a kwadebere site na usoro mkpuchi ahịhịa adịghị ike na-ejikọta ya na mkpụrụ, ihe mkpuchi mkpuchi adịghị mma, mkpuchi ahụ dị mkpa na nkwụsị nke oxidation dị ala, na ụzọ ndị ọzọ dị mkpa iji nyere aka. ya.

 

Usoro ịgbasa Plasma:

Usoro ịgbasa plasma bụ ọkachasị iji egbe plasma fesa ihe gbazere ma ọ bụ nke gbazere ọkara n'elu matriks graphite, wee sie ike na njikọ iji mepụta mkpuchi.Usoro a dị mfe iji rụọ ọrụ ma nwee ike ịkwadebe mkpuchi mkpuchi silicon carbide dị ntakịrị, ma mkpuchi silicon carbide nke a na-akwadebe site na usoro ahụ na-abụkarị adịghị ike ma na-eduga n'ịkwụsị oxidation na-adịghị ike, n'ihi ya, a na-ejikarị ya maka nkwadebe nke mkpuchi nke SiC composite. àgwà mkpuchi.

 

Usoro nke gel-sol:

Usoro gel-sol bụ tumadi iji dozie otu ihe ngwọta nke edo na nke doro anya na-ekpuchi elu nke matriks ahụ, na-ehicha n'ime gel wee na-agbanye iji nweta mkpuchi.Usoro a dị mfe iji rụọ ọrụ na ọnụ ala dị ala, ma mkpuchi a na-emepụta nwere ụfọdụ adịghị ike dị ka obere nkwụsị ọkụ ọkụ na nkwụsị dị mfe, n'ihi ya, a pụghị iji ya mee ihe n'ọtụtụ ebe.

 

Mmeghachi omume gas nke kemịkal (CVR):

CVR na-ebutekarịMkpuchi SiCsite na iji Si na SiO2 ntụ ntụ iji mepụta uzuoku SiO na okpomọkụ dị elu, na usoro mmeghachi omume kemịkal na-eme n'elu ihe C.NkeMkpuchi SiCnke a kwadebere site na usoro a na-ejikọta ya na mkpụrụ, ma mmeghachi omume okpomọkụ dị elu na ọnụ ahịa dị elu.

 

Mkpokọta vapor Chemical (CVD):

Ugbu a, CVD bụ isi teknụzụ maka ịkwadebeMkpuchi SiCna substrate elu.Usoro bụ isi bụ usoro mmeghachi omume anụ ahụ na nke kemịkalụ nke gas na-emeghachi ihe na-eme ihe n'elu ala, na n'ikpeazụ a na-akwado mkpuchi SiC site na ntinye n'elu ala.Ihe mkpuchi SiC nke teknụzụ CVD kwadebere na-ejikọta ya na elu nke mkpụrụ osisi ahụ, nke nwere ike imeziwanye nguzogide oxidation na nkwụsi ike nke ihe ndị na-emepụta ihe, ma oge ntinye nke usoro a dị ogologo, na mmeghachi omume gas nwere ụfọdụ nsị. gas.